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ISO 23170:2022
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| Price | Price USD 167.00 | ||
| Rating | Rating | ||
| Buy | Buy Add to Cart | ||
| Description |
Description
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS). |
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| Standard Number | Standard Number ISO 23170:2022 | ||
| Title | Title ISO 23170:2022 Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering | ||
| Status | Status Published | ||
| Publication Date | Publication Date 15 Jun 2022 | ||
| Cross References | Cross References | ||
| Descriptors | Descriptors | ||
| ICS | ICS 71.040.40 | ||
| Committee | Committee ISO/TC 201/SC 4 Depth profiling | ||
| ISBN | ISBN | ||
| Publisher | Publisher PECB Store | ||
| Format | Format PDF | ||
| Delivery | Delivery NO | ||
| Pages | Pages 29 | ||
| File Size | File Size KB |
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