ISO 23170

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ISO 23170:2022

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ISO 23170:2022 Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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USD 167.00

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

Standard Number ISO 23170:2022
Title ISO 23170:2022 Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Status Published
Publication Date 15 Jun 2022
Committee ISO/TC 201/SC 4 Depth profiling
Publisher PECB Store
Format PDF
Pages 29
Price USD 167.00
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